Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/67597
標題: Effect of a Ti interlayer on the bond strength and thermal stability of the Cu/benzocyclobutene-divinyl tetramethyldisiloxane interface
作者: Shieu, F.S.
薛富盛
Shiao, M.H.
關鍵字: Cu;Ti;BCB-DVS;cross-sectional TEM;bond strength;thermal stability;polyimide
Project: Journal of Adhesion Science and Technology
期刊/報告no:: Journal of Adhesion Science and Technology, Volume 12, Issue 1, Page(s) 19-28.
摘要: 
A series of experiments were carried out to investigate the adhesion properties and thermal stability of Cu/benzocyclobutene-divinyl tetramethyldisiloxane (BCB-DVS) interfaces by a stud pull test and cross-sectional transmission electron microscopy (TEM), respectively. Multilayered specimens were prepared by spin-coating a layer of BCB-DVS onto a Si wafer and subsequently a layer of Cu was deposited on the BCB-DVS by electron beam evaporation. It was found that the average bond strength of the Cu/BCB-DVS interface was improved slightly by either Ar ion bombardment of the BCB-DVS surface or a Ti interlayer between Cu and BCB-DVS. A significant improvement was obtained by a combination of Ar ion bombardment and a Ti interlayer, and resulted in the formation of titanium carbides or oxides between Ti and BCB-DVS. Upon annealing the specimens at 260 degrees C in vacuum for 18 h, interdiffusion of Cu into BCB-DVS to form clusters was observed, by cross-sectional TEM, for specimens with a 5 nm Ti interlayer, whereas the Cu island was not present in specimens with a 20 nm Ti interlayer. Interfacial reactions upon annealing were demonstrated by the formation of Cu3TiO5 and Cu-Ti intermetallics, identified by selected area diffraction.
URI: http://hdl.handle.net/11455/67597
ISSN: 0169-4243
DOI: 10.1163/156856198x00623
Appears in Collections:工學院

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