Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/67637
標題: Characteristics of TiVCrAlZr multi-element nitride films prepared by reactive sputtering
作者: Chang, Z.C.
薛富盛
Liang, S.C.
Han, S.
Chen, Y.K.
Shieu, F.S.
關鍵字: Multi-element alloy;Radio-frequency magnetron sputtering;Face-center-cubic solid-solution;high-entropy alloys;magnetron sputter;hard coatings;tin films;microstructure;deposition;elements;design;target
Project: Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms
期刊/報告no:: Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms, Volume 268, Issue 16, Page(s) 2504-2509.
摘要: 
Nitride films of multi-element TiVCrAlZr alloy were prepared on silicon substrates by reactive radio-frequency magnetron sputtering under different nitrogen/argon flow ratios ranging from 0% to 66.7%. The alloy film deposited in pure argon exhibited an amorphous structure and a very smooth surface, while a face-center-cubic solid-solution structure with strong (2 2 0), (1 1 1) to (2 0 0) orientation and different fracture feature and surface morphologies was observed in those films which were prepared under various nitrogen flow ratios. With increasing nitrogen flow ratio, the hardness and elastic modulus of the films increased and reached maximum values of 11 and 151 GPa at 50%. (C) 2010 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/67637
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2010.05.039
Appears in Collections:工學院

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