Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/67638
標題: Effect of nitrogen flow ratios on the microstructure and properties of (TiVCr)N coatings by reactive magnetic sputtering
作者: Tsai, D.C.
薛富盛
Huang, Y.L.
Lin, S.R.
Jung, D.R.
Shieu, F.S.
Project: Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms
期刊/報告no:: Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms, Volume 269, Issue 7, Page(s) 685-691.
摘要: 
The present paper reports the influence of growth conditions on the characteristics of (TiVCr)N coatings prepared by dc reactive magnetron sputtering at various N(2)-to-total (N(2) + Ar) flow ratios, R(N). The crystal structures, microstructure, and mechanical, electrical and optical properties under the R(N) were characterized. Results indicate that the TiVCr alloy and nitride coatings exhibited a single body-centered cubic type (BCC) and a face-centered cubic (FCC) solid solution structure, respectively. As the R(N) increases, the preferred orientation (TiVCr)N coatings changed to (2 0 0). The grain size also had a significant increase. The microstructure of the coatings obviously changed from a porous to a compact and dense columnar structure. Accordingly, the physical properties of the coatings were improved due to the densification of the structure. The hardness of the (TiVCr)N was enhanced to about 15 GPa, and the electrical resistivity was lowered to 10,000 mu Omega-cm. (C) 2011 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/67638
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2011.01.127
Appears in Collections:工學院

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