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|標題:||Effects of processing parameters on the microstructure and hardness of the arc ion-plated TIN on a type 304 stainless steel||作者:||Shiao, M.H.
|關鍵字:||steel;titanium nitride;transmission electron microscopy;hardness;titanium nitride coatings;thin-films;deposition;evaporation||Project:||Thin Solid Films||期刊/報告no：:||Thin Solid Films, Volume 375, Issue 1-2, Page(s) 163-167.||摘要:||
Substrate bias and specimen-to-target distance are two important parameters that can be manipulated during preparation of TiN films using a cathodic are ion plating system. Experiments were carried out to deposit TiN on a type 304 stainless steel for different cathode biases ranging from 100 to 300 V and specimen-to-target distances from 150 to 175 mm. Characterization of the microstructure of the TiN-coated steel was done both by transmission and scanning electron microscopy. The results show that the thickness of the TiN coatings increases with decreasing specimen-to-target distance. The TiN coatings exhibit a tapered columnar microstructure and the cone shape of the grains is influenced by the substrate bias. The resistance to deformation of the TiN coatings was evaluated by a Vickers microhardness indenter. It is found that the hardness of the coatings, ranging from 2200 +/- 40 to 1880 +/- 10, decreases with specimen-to-target distance for different substrate biases ranging from 100 to 300 V. (C) 2000 Elsevier Science S.A. All rights reserved.
|Appears in Collections:||工學院|
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