Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/67641
標題: Effects of processing parameters on the microstructure and hardness of the arc ion-plated TIN on a type 304 stainless steel
作者: Shiao, M.H.
薛富盛
Kao, S.A.
Shieu, F.S.
關鍵字: steel;titanium nitride;transmission electron microscopy;hardness;titanium nitride coatings;thin-films;deposition;evaporation
Project: Thin Solid Films
期刊/報告no:: Thin Solid Films, Volume 375, Issue 1-2, Page(s) 163-167.
摘要: 
Substrate bias and specimen-to-target distance are two important parameters that can be manipulated during preparation of TiN films using a cathodic are ion plating system. Experiments were carried out to deposit TiN on a type 304 stainless steel for different cathode biases ranging from 100 to 300 V and specimen-to-target distances from 150 to 175 mm. Characterization of the microstructure of the TiN-coated steel was done both by transmission and scanning electron microscopy. The results show that the thickness of the TiN coatings increases with decreasing specimen-to-target distance. The TiN coatings exhibit a tapered columnar microstructure and the cone shape of the grains is influenced by the substrate bias. The resistance to deformation of the TiN coatings was evaluated by a Vickers microhardness indenter. It is found that the hardness of the coatings, ranging from 2200 +/- 40 to 1880 +/- 10, decreases with specimen-to-target distance for different substrate biases ranging from 100 to 300 V. (C) 2000 Elsevier Science S.A. All rights reserved.
URI: http://hdl.handle.net/11455/67641
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(00)01258-x
Appears in Collections:工學院

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