Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/67658
DC FieldValueLanguage
dc.contributor.authorTsai, D.C.en_US
dc.contributor.author張守一zh_TW
dc.contributor.authorShieu, F.S.en_US
dc.contributor.authorChang, S.Y.en_US
dc.contributor.authorYao, H.C.en_US
dc.contributor.authorDeng, M.J.en_US
dc.contributor.author薛富盛zh_TW
dc.date2010zh_TW
dc.date.accessioned2014-06-11T05:53:47Z-
dc.date.available2014-06-11T05:53:47Z-
dc.identifier.issn0013-4651zh_TW
dc.identifier.urihttp://hdl.handle.net/11455/67658-
dc.description.abstractIn this study, TiVCr and TiVCrZrY films were deposited on Si substrates by magnetron sputtering with the application of radio-frequency substrate bias of different powers from 0 to 15 W. The crystal structures, microstructure, and mechanical, electrical, and optical properties under the effect of bias were characterized. Both the TiVCr and TiVCrZrY films constructed simple solid solutions from all alloyed elements. The TiVCr films possessed a body-centered cubic crystal structure with a pyramid-like surface, while the TiVCrZrY films had a hexagonal close-packed crystal structure with a domelike surface. The microstructure and properties of the films varied with bias power. As the bias power increased, the microstructure of the films obviously changed from a porous to a dense columnar feature, and the density of the voids existing between the columns decreased. Accordingly, the physical properties of the films were improved. The hardness of the TiVCr and TiVCrZrY films was enhanced to about 11 and 14 GPa, and the electrical resistivity was lowered to 80 and 100 mu cm, respectively.en_US
dc.language.isoen_USzh_TW
dc.relationJournal of the Electrochemical Societyen_US
dc.relation.ispartofseriesJournal of the Electrochemical Society, Volume 157, Issue 3, Page(s) K52-K58.en_US
dc.relation.urihttp://dx.doi.org/10.1149/1.3285047en_US
dc.subjectchromium alloysen_US
dc.subjectcrystal microstructureen_US
dc.subjectelectrical resistivityen_US
dc.subjecthardnessen_US
dc.subjectmetallic thin filmsen_US
dc.subjectreflectivityen_US
dc.subjectsputter depositionen_US
dc.subjecttitanium alloysen_US
dc.subjectvanadium alloysen_US
dc.subjectvoids (solid)en_US
dc.subjectyttrium alloysen_US
dc.subjectzirconium alloysen_US
dc.subjectnitride thin-filmsen_US
dc.subjectnuclear-waste containersen_US
dc.subjecthigh-entropy alloysen_US
dc.subjectpreferred orientationen_US
dc.subjecthydrogen absorptionen_US
dc.subjectstainless-steelen_US
dc.subjecttitaniumen_US
dc.subjectcoatingsen_US
dc.subjectmicrostructureen_US
dc.subjectmediaen_US
dc.titleStructures and Characterizations of TiVCr and TiVCrZrY Films Deposited by Magnetron Sputtering under Different Bias Powersen_US
dc.typeJournal Articlezh_TW
dc.identifier.doi10.1149/1.3285047zh_TW
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.fulltextno fulltext-
item.cerifentitytypePublications-
item.grantfulltextnone-
item.languageiso639-1en_US-
item.openairetypeJournal Article-
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