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|標題:||Bias voltage effect on the structure and property of chromium copper-diamond-like carbon multilayer films fabricated by cathodic arc plasma||作者:||Jao, J.Y.
|關鍵字:||Diamond-like carbon;TEM;Cathodic arc evaporation;Multilayer;amorphous-carbon;thin-films;coatings;evaporation;deposition;growth;hard||Project:||Applied Surface Science||期刊/報告no：:||Applied Surface Science, Volume 256, Issue 24, Page(s) 7490-7495.||摘要:||
Chromium copper-diamond-like carbon (Cr:Cu)-DLC films were deposited onto silicon and by cathodic arc evaporation process using chromium (Cr) and copper (Cu) target arc sources to provide Cr and Cu in the Me-DLC. Acetylene reactive gases were the carbon source and activated at 180 degrees C at 13 mTorr, and a substrate bias voltage was varied from -50V to -200V to provide the (Cr:Cu)-DLC structure. The structure, interface, and chemical bonding state of the produced film were analyzed by transmission electron microscope (TEM), IR Fourier transform (FTIR) spectra, and X-ray photoelectron spectroscopy (XPS). The results showed that the Cr-containing a-C:H/Cu coatings exhibited an amorphous layer of DLC:Cr layer and a crystalline layer of Cu multilayer structure. The profiles of sp(3)/sp(2) (XPS) ratios corresponded to the change of microhardness profile by varying the pressure of the negative DC bias voltage. These (Cr:Cu)-DLC coatings are promising materials for soft substrate protective coatings. Crown Copyright (C) 2010 Published by Elsevier B.V. All rights reserved.
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