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|標題:||Effects of ion assistance and substrate temperature on optical characteristics and microstructure of MgF2 films formed by electron-beam evaporation||作者:||Jaing, C.C.
|關鍵字:||MgF2;ion-assisted deposition;substrate temperature;optical property;microstructure;crystallinity;surface roughness;fluorine deficiency;optical loss;sio2 thin-films;vacuum ultraviolet;deposition;tio2;coatings;stress;energy||Project:||Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers||期刊/報告no：:||Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers, Volume 45, Issue 6A, Page(s) 5027-5029.||摘要:||
Magnesium fluoride thin films were prepared by electron-beam evaporation and ion-assisted deposition (IAD). The effects of ion, assistance and substrate temperature during deposition on the optical properties and microstructure were studied. The grain size, the crystallinity and the surface roughness of MgF2 films deposited without ion assistance all decreased with substrate temperature. MgF2 films deposited with IAD exhibited small grains, rough surfaces, fluorine deficiencies and large optical losses in the 200-500 nm wavelength range when bombarded with argon ions.
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