Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/69584
DC FieldValueLanguage
dc.contributor.authorJaing, C.C.en_US
dc.contributor.authorShiao, M.H.en_US
dc.contributor.authorLee, B.C.en_US
dc.contributor.authorLu, C.J.en_US
dc.contributor.authorLiu, M.C.en_US
dc.contributor.authorLee, C.H.en_US
dc.contributor.authorChen, H.C.en_US
dc.date2006zh_TW
dc.date.accessioned2014-06-11T05:58:32Z-
dc.date.available2014-06-11T05:58:32Z-
dc.identifier.issn0021-4922zh_TW
dc.identifier.urihttp://hdl.handle.net/11455/69584-
dc.description.abstractMagnesium fluoride thin films were prepared by electron-beam evaporation and ion-assisted deposition (IAD). The effects of ion, assistance and substrate temperature during deposition on the optical properties and microstructure were studied. The grain size, the crystallinity and the surface roughness of MgF2 films deposited without ion assistance all decreased with substrate temperature. MgF2 films deposited with IAD exhibited small grains, rough surfaces, fluorine deficiencies and large optical losses in the 200-500 nm wavelength range when bombarded with argon ions.en_US
dc.language.isoen_USzh_TW
dc.relationJapanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papersen_US
dc.relation.ispartofseriesJapanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers, Volume 45, Issue 6A, Page(s) 5027-5029.en_US
dc.relation.urihttp://dx.doi.org/10.1143/jjap.45.5027en_US
dc.subjectMgF2en_US
dc.subjection-assisted depositionen_US
dc.subjectsubstrate temperatureen_US
dc.subjectoptical propertyen_US
dc.subjectmicrostructureen_US
dc.subjectcrystallinityen_US
dc.subjectsurface roughnessen_US
dc.subjectfluorine deficiencyen_US
dc.subjectoptical lossen_US
dc.subjectsio2 thin-filmsen_US
dc.subjectvacuum ultravioleten_US
dc.subjectdepositionen_US
dc.subjecttio2en_US
dc.subjectcoatingsen_US
dc.subjectstressen_US
dc.subjectenergyen_US
dc.titleEffects of ion assistance and substrate temperature on optical characteristics and microstructure of MgF2 films formed by electron-beam evaporationen_US
dc.typeJournal Articlezh_TW
dc.identifier.doi10.1143/jjap.45.5027zh_TW
item.grantfulltextnone-
item.openairetypeJournal Article-
item.languageiso639-1en_US-
item.fulltextno fulltext-
item.cerifentitytypePublications-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
Appears in Collections:期刊論文
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