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|標題:||Enhanced anisotropic magnetoresistance of ion-beam-deposited Ni80Fe20-NixFe1-xO composite films||作者:||Lin, K.W.
|關鍵字:||anisotropic magnetoresistance (AMR);interface scattering;ion-beam;deposition technique;Ni80Fe20-NixFe1-xO composite films;giant magnetoresistance;magnetic superlattices;multilayers;liquids;field||Project:||Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers||期刊/報告no：:||Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers, Volume 44, Issue 9A, Page(s) 6522-6526.||摘要:||
Composite films of Ni80Fe20-NixFe1-xO were prepared by a dual ion-beam deposition technique. Magnetoresi stance (MR) was measured both at 77 and 298 K in a magnetic field applied in plane, parallel and perpendicular to the electrical current. Typical anisotropic magnetoresistance (AMR) was observed in as-deposited and annealed samples. The most interesting result is that for annealed samples, the shape of the MR curve is sharp and symmetric and the total MR ratio increases with oxygen content in the films, as compared with as-deposited samples. Furthermore, the total MR ratio reaches a maximum (similar to 4.5 and 14% at 298 and 77 K, respectively) in films prepared with 44% oxygen in the assist beam. This enhanced AMR is attributed to the strong anisotropic scattering at interfaces between the ferromagnetic metal and oxide phases.
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