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|標題:||Positive exchange bias in a Ni(80)Fe(20)/Ni(x)Fe(1-x)O thin-film bilayer||作者:||Lin, K.W.
van Lierop, J.
|關鍵字:||Exchange bias;Thin-film;Ion-beam sputter deposition||Project:||Journal of Magnetism and Magnetic Materials||期刊/報告no：:||Journal of Magnetism and Magnetic Materials, Volume 304, Issue 1, Page(s) E124-E127.||摘要:||
We have measured positive exchange bias in a Ni(80)Fe(20)/Ni(x)Fe(1-x)O thin-film nanocrystallite system. A series of solid solution Ni(x)Fe(1-x)O 40 nm thick films capped with 25 nm thick Ni(80)Fe(20) were deposited using a range of %O(2)/Ar bombardment energies (i.e. End-Hall voltages). Proper tuning of the deposition conditions results in a Ni(80)Fe(20)/Ni(x)Fe(1-x)O (30% O(2)/Ar) based bilayer that exhibits a positive exchange bias loop shift of H(ex)similar to 60 Oe at 150 K. (C) 2006 Elsevier B.V. All rights reserved.
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