Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/70772
標題: Generation of nano-scaled DNA patterns through electro-beam induced charge trapping
作者: Chi, P.Y.
Lin, H.Y.
Liu, C.H.
Chen, C.D.
關鍵字: emission;oligonucleotides;insulators
Project: Nanotechnology
期刊/報告no:: Nanotechnology, Volume 17, Issue 19, Page(s) 4854-4858.
摘要: 
In this study, distinct regions of trapped charges on glass substrates created by electron beam bombardment were utilized to attract and to immobilize DNA molecules. The negatively charged DNA molecules were attracted by the positive charge layer beneath the substrate surface resulting from escape of secondary electrons. With this mechanism, we demonstrated high-precision patterning of unmodified DNA molecules, independent of the length, sequence, and number of DNA strands, and with an attachment to the glass surface strong enough to withstand vigorous washing with water. DNA patterns with the line width of 50 nm were achieved.
URI: http://hdl.handle.net/11455/70772
ISSN: 0957-4484
DOI: 10.1088/0957-4484/17/19/012
Appears in Collections:期刊論文

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