Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/70831
標題: Effect of microstructure on the nanomechanical properties of TiVCrZrAl nitride films deposited by magnetron sputtering
作者: Chang, Z.C.
Liang, S.C.
Han, S.
關鍵字: Nanoindentation;TiVCrZrAl nitride films;Hardness;high-entropy alloys;mechanical-properties;tin films;temperature;coatings;system;fcc
Project: Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms
期刊/報告no:: Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms, Volume 269, Issue 18, Page(s) 1973-1976.
摘要: 
This paper describes the nanoindentation behavior of TiVCrZrAl nitride films grown on Si substrates by means of reactive radio-frequency magnetron sputtering at growth temperatures from 150 to 300 degrees C. We used cross-sectional transmission electron microscopy and X-ray diffraction to analyze the microstructure and crystallinity and nanoindentation techniques to study the hardness and elastic modulus. We found that a face-centered-cubic solid-solution structure with strong (2 0 0), (1 1 1), (2 2 0), and (3 1 1) orientations were revealed by X-ray diffraction. Upon increasing the growth temperature of the films, the hardness and elastic modulus increased to maximum values of 15.2 and 203.5 GPa, respectively. (C) 2011 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/70831
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2011.05.027
Appears in Collections:期刊論文

Show full item record
 

Google ScholarTM

Check

Altmetric

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.