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|標題:||Effect of microstructure on the nanomechanical properties of TiVCrZrAl nitride films deposited by magnetron sputtering||作者:||Chang, Z.C.
|關鍵字:||Nanoindentation;TiVCrZrAl nitride films;Hardness;high-entropy alloys;mechanical-properties;tin films;temperature;coatings;system;fcc||Project:||Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms||期刊/報告no：:||Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms, Volume 269, Issue 18, Page(s) 1973-1976.||摘要:||
This paper describes the nanoindentation behavior of TiVCrZrAl nitride films grown on Si substrates by means of reactive radio-frequency magnetron sputtering at growth temperatures from 150 to 300 degrees C. We used cross-sectional transmission electron microscopy and X-ray diffraction to analyze the microstructure and crystallinity and nanoindentation techniques to study the hardness and elastic modulus. We found that a face-centered-cubic solid-solution structure with strong (2 0 0), (1 1 1), (2 2 0), and (3 1 1) orientations were revealed by X-ray diffraction. Upon increasing the growth temperature of the films, the hardness and elastic modulus increased to maximum values of 15.2 and 203.5 GPa, respectively. (C) 2011 Elsevier B.V. All rights reserved.
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