Please use this identifier to cite or link to this item:
|標題:||Improved characteristics for Pd nanocrystal memory with stacked HfAlO-SiO2 tunnel layer||作者:||Kang, T.K.
|Project:||Solid-State Electronics||期刊/報告no：:||Solid-State Electronics, Volume 61, Issue 1, Page(s) 100-105.||摘要:||
Stacked HfAlO-SiO2 tunnel layers are designed for Pd nanocrystal nonvolatile memories. For the sample with 1.5 nm-HfAlO/3.5 nm-SiO2 tunnel layer, a smaller initial memory window is obtained compared to the sample with 3.5 nm-HfAlO/1.5 nm-SiO2 tunnel layer. Owing to the thermally induced traps in HfAlO-SiO2 films are located at a farther distance from the Si substrate and more effective blocking of charge leakage by asymmetric tunnel barrier, a larger final memory window and better retention characteristic can be obtained for Al/blocking oxide SiO2/Pd NC5/1.5 nm-HfAlO/3.5 nm-SiO2/Si structure. A N-2 plasma treatment can further improve the memory characteristics. Better memory characteristics can be obtained for Pd-nanocrystal-based nonvolatile memory with an adequate thickness ratio of HfAlO to SiO2. (C) 2011 Elsevier Ltd. All rights reserved.
|Appears in Collections:||期刊論文|
Show full item record
TAIR Related Article
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.