Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/71362
標題: Effects of H-2 plasma treatment on properties of ZnO:Al thin films prepared by RF magnetron sputtering
作者: Wang, F.H.
Chang, H.P.
Tseng, C.C.
Huang, C.C.
關鍵字: Transparent conductive oxide;Al-doped ZnO;Sputtering;Thin film;zinc-oxide films;pulsed-laser deposition;optical-properties;hydrogen;plasma;substrate-temperature;electrical-conductivity;solar-cells;al;films;transparent;orientation
Project: Surface & Coatings Technology
期刊/報告no:: Surface & Coatings Technology, Volume 205, Issue 23-24, Page(s) 5269-5277.
摘要: 
Al-doped ZnO (AZO) thin films were prepared on glass substrates by radio-frequency magnetron sputtering at deposition temperatures ranging from room temperature (RT) to 300 degrees C for transparent electrode applications. This study investigates the effects of H-2 plasma treatment on structural, electrical, and optical properties of AZO thin films. Plasma treatment was conducted at 300 degrees C using a plasma-enhanced chemical vapor deposition system for potential large size substrate applications. The crystal structure of plasma treated AZO films did not change considerably, but the surface roughness and surface grain size increased slightly. Improvement in electrical properties was strongly dependent on the deposition temperature. When the deposition temperature ranged from 300 degrees C to RT, the resistivity of plasma treated films decreased significantly by 22.7% to 97.6%, and the optical bandgap broadened by 0.011 to 0.076 eV. (C) 2011 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/71362
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2011.05.033
Appears in Collections:期刊論文

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