Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/71468
標題: Characterization of hydrogen-free diamond-like carbon films deposited by pulsed plasma technology
作者: Wang, D.Y.
Chang, C.L.
Ho, W.Y.
關鍵字: diamond-like carbon;graphite;adhesion;pulsed bias;assisted vapor-deposition;nitride films;nitrogen;interlayers;steel
Project: Thin Solid Films
期刊/報告no:: Thin Solid Films, Volume 355, Page(s) 246-251.
摘要: 
Diamond-like carbon (DLC) films demonstrated significant advantages in cutting and forming non-ferrous materials. The ultra-low friction coefficient and high surface hardness make DLC one of the most promising surface modification technologies available for processing advanced structural materials. In this study, Ti-doped and hydrogen-free DLC films (a-C:Ti) were synthesized by unbalanced magnetron sputtering of Ti and graphite targets. The high residual stress of the DLC thin films was dissipated through a compound interface ;consisting of a series of Ti, TiN, and TiC(x)N(y) graded interlayers. The target poisoning problem was resolved with a 2 kHz medium-frequency DC power supply. In addition, a 20-100 kHz variable frequency DC power supply was used for both are suppressing and substrate biasing. The effects of deposition parameters on film qualities were investigated by SEM/EDS, XRD, EELS and wear tests. Results demonstrated an improved DLC thin film with superior microhardness and adhesion strength compared with the conventional DLC deposited by PVD or PECVD processes. (C) 1999 Elsevier Science S.A. All rights reserved.
URI: http://hdl.handle.net/11455/71468
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(99)00513-1
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