Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/71474
標題: Effects of Ag contents and deposition temperatures on the electrical and optical behaviors of Ag-doped Cu2O thin films
作者: Tseng, C.C.
Hsieh, J.H.
Liu, S.J.
Wu, W.
關鍵字: Co-sputtering;Cu2O-Ag thin films;Opto-electronic properties;ito multilayers;silver;dependence;target
Project: Thin Solid Films
期刊/報告no:: Thin Solid Films, Volume 518, Issue 5, Page(s) 1407-1410.
摘要: 
Cu2O-Ag thin films were co-deposited by reactive sputtering on glass substrates. During deposition, Ag contents and deposited temperatures were varied. After deposition, a UV-VIS-NIR photometer and a Hall measurement system were used to characterize the optical and electrical properties of these films. The results showed that the Cu2O-Ag thin films had a decreased optical transmittance with the increase of Ag contents. The resistivity was also decreased, which is most likely due to the formation of Ag phase. Through the measurement of photo-induced conductivity, it was found that, when Ag concentration was at 4 at.%, the film had the highest increase in conductivity under light irradiation. This is due to the co-existence of Ag2O and Cu2O. However, when deposited at a temperature higher than room temperature, the photo-induced conductivity of this film became less obvious, apparently due to the dissociation of Ag2O. The results of Photoluminescence (PL) measurement confirmed that the Cu2O-Ag(4 at.%) sample might produce more electron-hole pairs than other samples, which caused the increase of conductivity. (C) 2009 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/71474
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2009.09.116
Appears in Collections:期刊論文

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