Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/71475
標題: Effects of ion implantation on the microstructure and residual stress of filter are CrN films
作者: Weng, K.W.
Chen, Y.C.
Han, S.
Hsu, C.S.
Chen, Y.L.
Wang, D.Y.
關鍵字: hybrid PVD;metal plasma ion implantation;glancing incident X-ray;diffraction;wear resistance;vacuum
Project: Thin Solid Films
期刊/報告no:: Thin Solid Films, Volume 516, Issue 16, Page(s) 5330-5333.
摘要: 
Chromium nitride coatings were deposited using a hybrid physical vapor deposition (PVD) system containing a filter are deposition (FAD) and a metal plasma ion implantation source (MPII). Exactly how surface residual stress affects film characteristics is investigated using glancing incident X-ray diffraction (GIXRD) and pole figure analyses. Compared with unimplanted CrN, implanted carbon typically increases compressive residual stress and hardness. Wear resistance was also improved by implanted carbon. (C) 2007 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/71475
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2007.07.088
Appears in Collections:期刊論文

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