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|標題:||Study on chromium oxide synthesized by unbalanced magnetron sputtering||作者:||Wang, D.Y.
|關鍵字:||chromium oxide;magnetron sputtering;nitride coatings;films;deposition;oxidation;behavior;stress||Project:||Thin Solid Films||期刊/報告no：:||Thin Solid Films, Volume 332, Issue 1-2, Page(s) 295-299.||摘要:||
Chromium oxide thin film with well-defined crystallinity was successfully deposited using an unbalanced magnetron sputtering process. Binding energy measurement of Cr 2p(3/2) showed a good agreement with the theoretical Cr2O3 ESCA spectrum. Substrate bias voltages affected the lattice orientation with a clear Cr2O3 (006) texture occurred at a bias voltage of -70 V. Excessive thermal stress resulted in cracking of Cr2O3 exposed to high temperatures. The thermally-grown Cr2O3, oxidized from both CrN and Cr2N, showed great mechanical integrity with high thermal stability. Higher hardness of Cr2O3 can be obtained at the OEM setting of 35% and bias voltage of -120 V. (C) 1998 Elsevier Science S.A. All rights reserved.
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