Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/71501
標題: Study on chromium oxide synthesized by unbalanced magnetron sputtering
作者: Wang, D.Y.
Lin, J.H.
Ho, W.Y.
關鍵字: chromium oxide;magnetron sputtering;nitride coatings;films;deposition;oxidation;behavior;stress
Project: Thin Solid Films
期刊/報告no:: Thin Solid Films, Volume 332, Issue 1-2, Page(s) 295-299.
摘要: 
Chromium oxide thin film with well-defined crystallinity was successfully deposited using an unbalanced magnetron sputtering process. Binding energy measurement of Cr 2p(3/2) showed a good agreement with the theoretical Cr2O3 ESCA spectrum. Substrate bias voltages affected the lattice orientation with a clear Cr2O3 (006) texture occurred at a bias voltage of -70 V. Excessive thermal stress resulted in cracking of Cr2O3 exposed to high temperatures. The thermally-grown Cr2O3, oxidized from both CrN and Cr2N, showed great mechanical integrity with high thermal stability. Higher hardness of Cr2O3 can be obtained at the OEM setting of 35% and bias voltage of -120 V. (C) 1998 Elsevier Science S.A. All rights reserved.
URI: http://hdl.handle.net/11455/71501
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(98)01266-8
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