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標題: 以射頻磁控濺鍍法在PET基材上沈積氧化鋁薄膜之製備與分析
作者: 吳芝緯
關鍵字: 射頻磁控濺鍍;氧化鋁薄膜;塑膠基板;氣體阻隔層
出版社: 國立中興大學工學院;Airiti Press Inc.
Project: 興大工程學刊, Volume 15, Issue 2, Page(s) 109-118.
Aluminum oxide thin films acting as a water barrier have been deposited on polyethylene terehthalate (PET) substrate by r.f. magnetron sputtering in which an alumina target is bombarded. The influences of process parameters on the resistance of water permeation of the aluminum oxide thin film were studied. The parameters included oxygen flow rate, chamber pressure, rf power and deposition time. The microstructural, morphological, mechanical and gas barrier properties of the coatings were investigated by scanning electron microscopy, atomic force microscopy, flexible test, and water vapor transmission measurement, respectively. It was shown that the water permeation rate of the aluminum oxide thin film was influenced by the process parameter of sputtering. Aluminum oxide thin films with denser structure and better properties were obtained in pure argon atmosphere, at lower chamber pressure and with higher r.f. power. The water permeation rate was reduced from 7.3g/m2 day down to 0.56g/m2 day with the best process condition, namely pure pure argon, base pressure of 2 mTorr, r.f. power of 4.9 W/cm2 and deposition time of 240 min, film thickness of 225nm, in this study.

ISSN: 1017-4397
Appears in Collections:第15卷 第2期

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