Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/84739
標題: Optical and Electrical Properties of the DifferentMagnetron Sputter Power 300∘C Deposited Ga2O3-ZnO ThinFilms and Applications in p-i-n 𝛼-Si:H Thin-Film Solar Cells
Project: International Journal of Photoenergy, Volume 2013, Article ID 270389.
摘要: 
A compound of ZnO with 3 wt% Ga2O3 (ZnO : Ga2O3 = 97 : 3 in wt%, GZO) was sintered at C as a target. The GZO thin films were deposited on glass using a radio frequency magnetron sputtering system at C by changing the deposition power from 50 W to 150 W. The effects of deposition power on the crystallization size, lattice constant (c), resistivity, carrier concentration, carrier mobility, and optical transmission rate of the GZO thin films were studied. The blue shift in the transmission spectrum of the GZO thin films was found to change with the variations of the carrier concentration because of the Burstein-Moss shifting effect. The variations in the optical band gap () value of the GZO thin films were evaluated from the plots of , revealing that the measured value decreased with increasing deposition power. As compared with the results deposited at room temperature by Gong et al., (2010) the C deposited GZO thin films had apparent blue shift in the transmission spectrum and larger value. For the deposited GZO thin films, both the carrier concentration and mobility linearly decreased and the resistivity linearly increased with increasing deposition power. The prepared GZO thin films were also used as transparent electrodes to fabricate the amorphous silicon thin-film solar cells, and their properties were also measured.
URI: http://hdl.handle.net/11455/84739
DOI: 10.1155/2013/270389
Appears in Collections:電機工程學系所

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