Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/86141
DC FieldValueLanguage
dc.contributor.authorLai, Guan-Yuzh_TW
dc.contributor.authorKumar, Dinesh Pzh_TW
dc.contributor.authorPei, Zingwayzh_TW
dc.date2014-
dc.date.accessioned2015-08-03T02:26:06Z-
dc.date.available2015-08-03T02:26:06Z-
dc.identifier.issn1556-276Xzh_TW
dc.identifier.urihttp://hdl.handle.net/11455/86141-
dc.description.abstractIn this study, we applied a metal catalyst etching method to fabricate a nano/microhole array on a Si substrate for application in solar cells. In addition, the surface of an undesigned area was etched because of the attachment of metal nanoparticles that is dissociated in a solution. The nano/microhole array exhibited low specular reflectance (<1%) without antireflection coating because of its rough surface. The solar spectrum related total reflection was approximately 9%. A fabricated solar cell with a 40-μm hole spacing exhibited an efficiency of 9.02%. Comparing to the solar cell made by polished Si, the external quantum efficiency for solar cell with 30 s etching time was increased by 16.7%.zh_TW
dc.language.isoenzh_TW
dc.relationNanoscale Research Letters, Volume 9, Issue 1, Page(s) 654.zh_TW
dc.subjectEfficiencyzh_TW
dc.subjectMetal catalystzh_TW
dc.subjectNano/microhole Si arrayzh_TW
dc.subjectReflectancezh_TW
dc.titlePeriodic nano/micro-hole array silicon solar cellzh_TW
dc.typeJournal Articlezh_TW
dc.identifier.doi10.1186/1556-276X-9-654zh_TW
item.grantfulltextrestricted-
item.openairetypeJournal Article-
item.languageiso639-1en-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.cerifentitytypePublications-
item.fulltextwith fulltext-
Appears in Collections:電機工程學系所
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