Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/91948
標題: 離子束轟擊[鐵/釩]薄膜之微結構及磁性質研究
The studies of microstructure and magnetic properties of ion beam bombarded [Fe/V] thin films
作者: 陳穎嫻
Ying-Hsyan Chen
關鍵字: 磁性薄膜;ion beam bombarded;magnetic
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摘要: 
'本研究利用雙離子束濺鍍系統(IBAD)製備Al/[Fe/V]/SiO2雙層薄膜,鋁層作為薄膜保護層,並利用輔助離子束(End Hall)轟擊鐵磁層,探討Al/[Fe/V]/SiO2雙層薄膜之微結構及磁性質。
X光繞射分析(XRD)得知晶體結構,由XRD分析圖發現Al/[Fe/V]/SiO2雙層薄膜在82.3°及42.1°處有繞射峰,於JCPDS Card 之Fe(211)與V(110)晶體平面處有繞射峰。鐵與釩皆為體心立方(b.c.c.)結構,利用Bragg’s law計算得到薄膜中鐵晶格常數a=2.98 A,與釩晶格常數a=3.03 A,與塊材理論值相近。接著利用穿透式電子顯微鏡(TEM)進行晶粒尺寸分佈、膜厚及結構成分分析,利用TEM暗視野圖統計出平均晶粒尺寸約為9.5 nm, TEM橫截面圖可辨別本實驗試片有鋁、鐵、釩三層斷面及各層膜厚分別為鋁層膜厚約為1 nm;鐵層膜厚約為6 nm;釩層膜厚約為31 nm。
磁性質方面,在外加磁場(12k Oe)利用震動樣品磁力計(VSM) 沿平行膜面量測薄膜磁性質於室溫(298K)及低溫(180K),觀察到低溫時有較大的飽和磁化量,較高的剩磁比,而矯頑磁力則無明顯變化。
'
URI: http://hdl.handle.net/11455/91948
其他識別: U0005-0402201513463200
Rights: 同意授權瀏覽/列印電子全文服務,2015-02-04起公開。
Appears in Collections:材料科學與工程學系

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