Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/91963
標題: 不同製程參數對以丙烷/氨氣製備熱化學氣相沉積碳薄膜性質之影響
Effects of different process parameters on the properties of carbon films prepared by thermal chemical vapor deposition using propane/ammonia mixtures
作者: 吳丹筠
Dan-Yun Wu
關鍵字: 碳薄膜,熱化學氣相沉積,丙烷/氨氣;carbon film,thermal chemical vapor deposition,propane/ammonia
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摘要: 
This study investigates the effects of C3H8/(C3H8+NH3) ratio on the properties of carbon films prepared by thermal chemical vapor deposition. We also investigate the effects of mass flow rate, deposition temperature and working pressure on the deposition rates of carbon films. The thickness, microstructure, surface property, electrical property of carbon films and residual gas of process were investigated by field emission scanning electron microscopy, X-ray diffraction spectrometer, Raman scattering spectrometer, X-ray photoelectron spectrometer, atomic force microscopy, contact angle meter, four-points probe, and residual gas analyzer. Experimental results indicate that the deposition rate raises with increasing the C3H8/(C3H8+NH3) ratio, residence time, deposition temperature, and working pressure. About sixteen NH3 molecules will suppress one C3H8 molecule to form the carbon film. Moreover, the pyrolysis of C3H8/NH3 mixtures is dominated by about a first order process, which is arisen from the adsorption of main product gases methane (CH4), acetylene (C2H2), and ethylene (C2H4) on the silica glass plate substrate. The activation energy of this process is 439 kJ/mol. The surface roughness and electrical resistivity of carbon films increase with increasing the C3H8/(C3H8+NH3) ratio, but the crystallinity, degree of ordering, size of mean crystallite (La and Lc), content of sp2 C=C bonding and water contact angle of carbon films decrease. Finally, the results of thermal CVD carbon deposition using C3H8/NH3 mixtures are compared with those using CH4/NH3, C2H2/NH3, C2H4/NH3, and C3H8/N2 mixtures.

本篇論文以熱化學氣相沉積法製備碳薄膜,探討不同C3H8/(C3H8+NH3)比例對碳薄膜性質之影響。並探討不同氣體總流量、沉積溫度和工作壓力對沉積速率的影響。利用場發射掃描式電子顯微鏡、X光繞射儀、拉曼散射光譜儀、X光光電子能譜儀、原子力顯微鏡、接觸角量測儀、四點探針儀和殘留氣體分析儀量測碳薄膜的沉積厚度、微觀結構、表面特性、電學性質和製程上之殘留氣體。實驗結果發現,碳薄膜的沉積速率會隨著C3H8/(C3H8+NH3)比例、停留時間、沉積溫度以及工作壓力的增加而上升。在沉積過程中,16個氨氣會抑制1個丙烷形成碳薄膜。碳薄膜主要是由氣體中的CH4、C2H2和C2H4裂解沉積於石英玻璃平板上,其為1次方反應過程。此實驗之活化能約為439 kJ/mol。碳薄膜的表面粗糙度與電阻率會隨著C3H8/(C3H8+NH3)比例增加而上升;而碳薄膜的結晶度、結構有序程度、平均晶粒大小 (La和Lc)、sp2 C=C鍵結的相對含量與水接觸角會隨著C3H8/(C3H8+NH3)比例增加而下降。最後,將本實驗丙烷/氨氣與甲烷/氨氣、乙炔/氨氣、乙烯/氨氣和丙烷/氮氣之碳薄膜性質互相比較。
URI: http://hdl.handle.net/11455/91963
其他識別: U0005-0107201409382800
Rights: 不同意授權瀏覽/列印電子全文服務
Appears in Collections:材料科學與工程學系

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