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http://hdl.handle.net/11455/93968
標題: | Hot-wire chemical vapor deposition of nanocrystalline silicon for ambipolar thin-film transistor applications | 作者: | Bing-Rui Wu Tsung-Hsien Tsai Dong-Sing Wuu |
Project: | Applied Surface Science, Volume 354, Part A, Page(s) 216-220 | URI: | http://hdl.handle.net/11455/93968 |
Appears in Collections: | 材料科學與工程學系 |
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