Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/9411
標題: 含鈦金屬之二硫化鉬濺射鍍膜之製程與特性研究
The process and property of titanium doped MoS2 sputtering thin film
作者: 陳志逸
chen, zeih - yei
關鍵字: MoS2;二硫化鉬
出版社: 材料工程學研究所
摘要: 
二硫化鉬 ( molybdenum disulfide, MoS2 ) 因具有似H.C.P的雙分
子層層狀晶體結構,而具備良好的磨潤特性,因此受到相當的重視與研究
。目前已有許多成功的方法製備出MoS2鍍膜,諸如:噴塗法、複合濕度法
、電泳法、蒸鍍法、脈衝雷射蒸鍍法、電鍍鉬膜的硫化、化學汽相沈積、
有機金屬化學汽相沈積、濺射鍍膜法等,但在考慮精密度、膜厚控制、容
許公差、附著性、摩擦係數、使用壽命、環境污染、生產成本等因素下,
仍以濺鍍法較優於其他;但由於MoS2濺射鍍膜對濕度的敏感性,使鍍膜在
大氣環境下使用時,容易產生MoS2-xOx及MoO3化合物,而使鍍膜摩擦係數
不穩定及有效壽命減少;因此,改善MoS2濺射鍍膜對環境濕度的抵抗能力
成為研究重點,根據Roberts提出可能的改善方向有五:(1) 複層結構鍍
膜 (2) 添加金屬元素 (3) 提高沈積率 (4) 離子植入或離子轟擊 (5) 脈
衝雷射,其共通點皆為了增加鍍膜緻密性;本研究即使用非平衡磁控濺射
製備MoS2鍍膜,並嘗試利用添加Ti金屬元素形成複層結構鍍膜和提高沈積
率的方式,企圖改善此一缺點,期望能達到延長使用壽命、穩定摩擦係數
、提高元件精密度、降低生產成本和提高抵抗環境濕度能力的目的。本研
究以非平衡磁控濺備之MoS2( Ti )鍍膜,經分析證實MoS2( Ti )鍍膜結構
為MoS2 / Ti / MoS2的週期性交疊的複層結構,在表面具有卵石狀組織且
鍍膜結構緻密性隨著Ti介層厚度的增加而增加,因而減少大氣環境中的氧
擴散至鍍膜內部的機會。本實驗製備之MoS2( Ti )鍍膜由於複層結構中的
Ti介層作用而形成低結晶性鍍膜,其次,複層結構中的Ti介層阻止柱狀組
織生長,使MoS2層具有typeII MoS2晶體結構特徵,經由磨耗後,原本部
份非平行滑移方向的MoS2( 002 )基面有轉而平行滑移方向的趨勢,因而
形成具低剪切力的MoS2 (002)優選取向潤滑鍍膜。其次,Ti介層的作用作
用宛如新基材,使MoS2週期性生長,因而有效膜厚週期性產生,增加了鍍
膜的使用壽命;其中,MoS2( 7nmTi )鍍膜的有效壽命為純MoS2鍍膜的5倍
。同時,MoS2( Ti )鍍膜含有足夠的Ti元素,在大氣環境下,Ti元素比鍍
膜元素先氧化形成TiO2化合物,因而有效減緩了MoS2的氧化反應,避免大
氣環境中的氧擴散至鍍膜內部,而提昇鍍膜抵抗環境濕度能力。

AbstractMolybdenum disulphide ( MoS2 ) is presently the metal
dichalcogenide solid lubricant of choice for precision satellite
mechanisms. The hexagonal crystal structure of MoS2 provides the
possibility of an ultralow friction surfacBecause of its highly
anisotropic lamellar morphology with a van der Waals bonded
basal plane oriented parallel to the surface. The vacuum
friction performance and temperature insensitivity of MoS2 makes
it the lubricant of choice for many spacecraft mechanism
applications.Roberts was among the first to demonstrate improved
sputtering techniques leading to highly densified MoS2 films
having remarkably low friction coefficient of less than 0.01 in
vacuum. Improved MoS2 thin films deposited by multilayering, co-
sputtering of metals, high rate r.f. magnetron sputtering, ion
beam techniques and pluse laser have been under development for
use to improved the sensivity of humidity.This study
concentrated on films that were multilayer coatings of MoS2 with
titanium, and it is called " MoS2(Ti)". MoS2(Ti) multilayered
coating consisting of titanium metal layers and solid
lubricanting MoS2 layers were synthesized perodily by the
unbalanced magnetron sputtering. Multilayer thickness ranged
from 0 nm to 7 nm while the multilayer perodic spaced ranged
from 13 nm to 20 nm. XRD, Raman, and TEM analysis of the MoS2(
Ti) film reveals its quasi-amorphous nature due to the
deposition process. SEM, TEM, and XRD revealed that the film
structure had MoS2/Ti/MoS2 multilayer structure and densed
islands morphology. However, MoS2(Ti) thin film exhibited
significant orientation of their basal planes parallel to the
substrate after pin-on-disc tests. MoS2(Ti) thin film in sliding
contact showed an extremely low friction coefficient of 0.073 to
0.123, and performance endurence of 690 meters to 3,400 meters,
that titanium layers and MoS2 layers were failure in one layer
by one layer. The use of titanium is oxized more earily MoS2
film, and provided that the oxygen diffusion in MoS2(Ti) film.
This results is reduced the oxidizing reaction of MoS2(Ti)
films.
URI: http://hdl.handle.net/11455/9411
Appears in Collections:材料科學與工程學系

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