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dc.contributor.advisorFu Hsing Luen_US
dc.contributor.authorChen, Hung Yingen_US
dc.description.abstract本研究是以陰極電弧電漿沈積法將氮化鈦披覆於銅基材上。經低掠角 X光繞射的結果顯示鍍膜為岩鹽型的氮化鈦晶體結構,歐傑電子能譜結果 顯示鍍膜的成分為鈦、氮,且鈦與氮的原子濃度比稍小於1。由X光光電能 譜中的Ti 2p、N 1s及O 1s結果顯示在鍍膜的表面上存在非晶質的TiO2及 TiNxOy,而鍍膜內則為氮化鈦。氮化鈦在鍍著時間為5分鐘後,經低掠角X 光繞射結果顯示,其優選方向為(200),當鍍著時間為10分鐘後,優選 方向為(111),而當鍍著時間為30、60分鐘後,優選方向為(220)。鍍 膜在空氣300C下退火2小時後,外觀顏色並未改變,由X光光電能譜儀中的 Ti 2p、N 1s及O 1s能譜顯示鍍膜表面形成TiNxOy。而經空氣400C、500C 下退火2小時後,鍍膜顏色分別改變為藍色及粉紅色,鍍膜表面氧化成 TiO2。在氮、氬氣500C下退火處理2小時後,顏色未改變,經X光光電能譜 儀中的Ti 2p、N 1s及O 1s能譜顯示,在鍍膜的表面形成TiNxOy的化合物 。在700C, CO2/N2/H2=10:81:9的氣氛下退火處理6小時後,鍍膜的顏色改 變為藍色,經X光光電能譜儀中的Ti 2p、N 1s及O 1s能譜顯示,在鍍膜的 表面形成TiO2及TiNxOy。而在640C, N2/H2=9氣氛下退火處理2小時後,鍍 膜表面顏色未改變,經X光光電能譜儀中的Ti 2p、N 1s及O 1s能譜顯示, 在鍍膜的表面形成TiNxOy。因此我們推測氮化鈦鍍膜在控制氣氛下退火, 若鍍膜表面顏色未改變,則為形成TiNxOy所致,若顏色已改變,則形成 TiO2及TiNxOy。鍍膜表面經由掃描式電子顯微鏡及光學顯微鏡下使用相同 位置拍照的結果顯示,在表面上存在著孔洞及微粒。孔洞是由微粒脫離所 導致,且微粒為突出物,其主要成分為鈦。經空氣、氮氣、氬氣、N2/ H2=9氣氛下退火後,微粒並未離開鍍膜表面。zh_TW
dc.description.abstractIn this study, the TiN films were deposited on Cu substrates by the cathodic arc plasma dposition technique. The grazing incidenceX-ray diffraction results showed that the films possess a rock-saltcrystal structure. The results of Auger electron spectroscopyshowed that the atomic concentration ratio of Ti and N was smaller than 1. Thin amorphous TiO2 and TiNxOy layers werefound by analyzing the Ti-2p, N-1s and O-1s spectra of the X-ray photoelectron spectroscopy (XPS). The preferred orientation of TiN films for various deposition times were found to change from(200) [5 min], (111) [10 min] to (220) [both for 30 min and 60 min]. The results of XPS showed that the TiNxOy layer was formed on the TiN films surface after annealing the films in air for 2 hr at 300 degree C,N2 and Ar for 2 hr at 500 C, and in N2/H2=9 for 3 hr at 640 degree C. The colorof the films were not changed. After annealing in air for 2 hr both at 400 degree C and 500 degree C as well as in CO2/N2/H2=10:81:9 for 6 hr at 700 degree C, both TiO2 and TiNxOy layers were found on the TiN films surface. The color of the of films changed into blue, pink and blue. From the results, we conclude that the color of the on TiN films remain unchangedafter annealing due to is the formation of TiNxOy while the color change is due to the formation of TiO2 and TiNxOy on the sample surface. Both voids and macropartilces on the TiN surface were investigatedby using the scanning electron microscopy and optical microscopy. The macroparticles contain mainly the Ti element and not leave thesurface after annealing in air, N2, Ar, N2/H2=9 at 300 degree C~640 degree C for 2 hr.en_US
dc.subjecttitanium nitrideen_US
dc.titleCharacteriazation of TiN Films on Cu Substrate After Annealing under Controlled Atmosphereen_US
dc.typeThesis and Dissertationzh_TW
item.openairetypeThesis and Dissertation-
item.fulltextno fulltext-
Appears in Collections:材料科學與工程學系
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