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dc.contributor.advisorF. S. Shieuen_US
dc.contributor.authorHsieh, Wen-Pinen_US
dc.description.abstract本研究係利用能量過濾型穿透式電子顯微鏡(FETEM)、電子能量耗失儀( EELS)、高解析度穿透式電子顯微鏡(HRTEM)、掃瞄式電子顯微鏡(SEM)及 低略角x-ray等分析技術來探討以封閉磁場非平衡磁控濺鍍系統(CFUBMS) 鍍著含鈦類鑽多層碳膜於304不鏽鋼基材上的微結構及化學成分;此外, 經由TEM之橫截面(cross section)試片計算鍍膜之殘留應力,並與雷射掃 瞄法所測得之殘留應力值相互比較。在微結構分析方面,藉由穿透式電子 顯微鏡之微區分析及低略角X-ray不同入射角之分析結果得知試片鍍膜之 多層結構,從基材到表面的順序分別為不鏽鋼、純鈦(Ti)層(0.4μm)、氮 化鈦(TiN)、氮碳化鈦(TiC0.7N0.3),最外層為氮碳化鈦(TiC0.7N0.3)、 碳化鈦(TiC)、石墨和鑽石的混和層,鍍膜組織並具有柱狀晶結構,且在 該區之繞射圖中發現其具有擇優選向 (preferred orientation) ,再經 由電子能量耗失譜進一步得知鍍膜最外層含有長無序之非晶質碳成分;以 SEM及EDS分析經腐蝕及未經腐蝕之試片表面,發現試片最外層之柱狀組織 較內層疏鬆,並且內含鑽石微晶。本實驗利用TEM的橫截面試片中鍍膜彎 曲的現象所計算得之殘留應力值為 ~10 GPa,而以雷射掃瞄法量測試片彎 曲曲率而計算出之殘留應力為9.4GPa,顯示經由TEM量測殘留應力的方法 具有很高之可信度;經由彈性力學所算得之熱應力為2.6 GPa,約佔鍍膜 殘留應力之四分之一,其顯示含鈦類鑽碳膜之殘留應力主要係由鍍膜製程 中參數設定引起之內應力所致。zh_TW
dc.description.abstractThe microstructure and chemistry of functionally gradient Ti- doped diamond-like carbon films prepared by a closed field magnetron sputtering system on an AISI 304 stainless steel was analyzed by energy filtering transmission electron microscopy (TEM), electron energy loss spectroscopy (EELS), high resolution TEM, scanning electron microscopy (SEM), and glancing angle X- ray diffraction. From both the TEM and X-ray diffraction results , it was found that the microstructure across the coating thickness direction from the substrate to the free surface are 304 stainless steel, Ti layer, TiN, a mixture of TiN and TiC0.7 N0.3, and a region consisting of TiC0.7N0.3、TiC、graphite、 diamond and amorphous carbon near the coating surface (< 500 a). Also, observed from the cross-section TEM are the columnar structure of the DLC coating and the presence of preferred orientation in the coating illustrated by the arced SAD patterns. Chemical analysis of the outmost coating layer (<300 a) was carried out by EELS. The carbon K-edge in the EELS spectra of a Ti-rich region indicates the existence of Ti-C bond formation, whereas amorphous carbon dominates in the Ti- lacking region. To investigate the corrosion resistance of the Ti-doped DLC films, the coated specimen was emerged in a H2SO4-containing solution for various time and then examined by SEM and energy- dispersive X-ray spectroscopy. It is shown that the DLC coating has a good corrosion resistance and that the columnar structure near the outmost surface was looser than that near subsurface where diamond microcrystallites are present. In addition, residual stress in the DLC films was measured both from a cross- section TEM image and by a laser scanner system. From the bending curvature of the DLC coated specimen, the residual compressive stress was calculated to be ~10 GPa. Using an elastic solution, the unrelaxed thermal stress due to a difference in the coefficients of thermal expansion is calculated to be 2.6 GPa. As a result,, it can be concluded that the residual stress in theDLC coating was caused mainly by the internal stress produced by the energetic ion bombardment during deposition.zh_TW
dc.subjectresidual stressen_US
dc.subjectElectron Microscopeen_US
dc.titleMicrostructure and Residual Stress of a Ti-Doped Diamond-Like- Carbon Filmen_US
dc.typeThesis and Dissertationzh_TW
item.openairetypeThesis and Dissertation-
item.fulltextno fulltext-
Appears in Collections:材料科學與工程學系
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