Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/95800
標題: Influence of deposition parameters on the structure and optical property of Zn(S,O) films
作者: 蔡篤承
Du-Cheng Tsai
Bing-Hau Kuo
Zue-Chin Chang
Erh-Chiang Chen
Fuh-Sheng Shieu
關鍵字: optical materials;sputtering;crystal structure;optical properties;X-ray diffraction
出版社: METALS AND MATERIALS INTERNATIONAL
Project: Metals and Materials International, January 2017, Volume 23, Issue 1, pp 163–169
摘要: 
This paper presents the influence of process parameters, including sputtering power, oxygen partial pressure (R O), and substrate temperature on the optical property of Zn(S,O) thin films fabricated by radio frequency magnetron sputtering technology and deposited on glass substrates. The chemical composition, structural and optical properties of the samples were investigated by electron spectroscopy for chemical analysis, X-ray diffraction, and spectrophotometer. All the films mainly exhibited β-ZnS phase with (111) preferred orientation. [S]/([S]+[O]) ratio increased at high sputtering power, low RO, and low substrate temperature. Moderate ranges in sputtering power and substrate temperature and low RO resulted in large grain size. Adatoms are expected to exhibit increased mobility under these conditions. Average transmittance exceeded 75% in the visible wavelength region. Bandgap under these conditions was dominated strongly by the change in grain size and [S]/([S]+[O]) ratio. Optical properties of Zn(S,O) thin films could be modified, which is promising for optoelectronic applications.
URI: http://hdl.handle.net/11455/95800
DOI: 10.1007/s12540-017-6374-9
Appears in Collections:材料科學與工程學系

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