Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/9703
DC FieldValueLanguage
dc.contributor.advisor施漢章zh_TW
dc.contributor.advisorF.H.Luen_US
dc.contributor.advisor呂福興zh_TW
dc.contributor.author汪俊翰zh_TW
dc.contributor.authorG.H.Wangen_US
dc.date1999zh_TW
dc.date.accessioned2014-06-06T06:43:38Z-
dc.date.available2014-06-06T06:43:38Z-
dc.identifier.urihttp://hdl.handle.net/11455/9703-
dc.description.abstract以PVD沈積硬質薄膜具有沈積率高、附著性佳、無公害等優勢,而氮化鉻鍍膜因具有良好的機械性質、優秀的抗腐蝕和高溫氧化的特性,已在近幾年受到廣泛的研究、發展。利用各種製程參數沈積出不同的氮化鉻結晶相,因優選方位的不一,氮化鉻硬膜的堆積方式、內應力、機械性質等亦會隨之有相異的性質表現。此外針對不同的PVD鍍膜系統,其沈積方式和成品也是工業上常需取捨、評鑑的地方﹔磁控濺射系統沈積鍍膜一向以平滑、緻密著稱,相對的陰極電弧系統則具高沈積速率、鍍膜具較佳機械性質等長處。本文即是針對氮化鉻的不同優選方向和不同的鍍膜方式做一廣泛的研究,包含工業上必要面對的表面形貌、機械性質、磨耗行為和腐蝕抗性等性質。 本研究為利於實驗進行及避免過大的基材效應,採用市面常用的SS304不銹鋼和SKD11工具鋼為基材,並調整不同的鍍膜沈積參數,成功地用UBM系統沈積出CrN(111)、CrN(200)、Cr2N(111)之結晶相,CAE系統沈積出CrN(220)、CrN(200)的優選方向。利用XRD、XPS對鍍膜做成分與結構之鑑定,並用SEM和AFM做表面形貌的分析。在機械性質上的研究亦包含有﹕微硬度、壓痕與刮痕的附著力量測,並進一步探討鍍膜的磨耗行為。 研究結果發現,UBM系統具有平整表面,其表面形貌受施加偏壓增大而更粗糙,而CAE系統鍍膜雖具高沈積速率,卻難以避免微粒、孔洞的出現,利用加裝圓形套筒的改良靶裝置將可有效地降低微粒數與尺寸大小。 氮化鉻硬膜中,Cr2N具有高硬度、低附著力和較差磨耗抗性﹔CrN(200)有CrN中較高的硬度,和Cr2N一般較缺乏韌性,但其平整、緻密的表面,加以改善仍可有效用於精密模具上。將刮痕試驗得到的臨界荷重加以比較,在UBM沈積的CrN(111)或以CAE系統沈積的鍍膜,具有高附著力,此外附著力和偏壓、硬度等並無直接關係﹔Cr2N便具最高硬度,高偏壓沈積的CrN(111)便具有極佳的附著性和磨耗行為。 氮化鉻的磨耗阻力主要來至黏著磨耗,然對附著力較差、缺乏韌性的Cr2N或CrN(200)之鍍膜,其磨耗軌跡中亦伴隨著研磨磨耗的生成,其硬膜在受施加荷重的壓力作用下,較脆鍍膜崩落後的顆粒便形成極佳的磨屑,使的整個磨耗行為亦受研磨磨耗影響,使得平均磨耗係數變高。 腐蝕抗性上,鍍以氮化鉻薄膜確有助增大鈍化區,然在不同結晶相的氮化鉻硬膜,亦發現平整、緻密之鍍膜表面會帶來較貴重的腐蝕電位與較小的腐蝕電流傾向。zh_TW
dc.description.abstractChromium nitride coatings exhibit good mechanical, corrosion and oxidation protection properties and can have various orientations. Preferred orientations of CrN(111), CrN(200) and Cr2N(111) on SUS304 and SKD11 were successfully deposited by unbalanced magnetron (UBM) sputtering system; preferred orientations of CrN(200) and CrN(220) were deposited by cathodic arc evaporation (CAE) system. To achieve different orientations, several mechanical properties of deposited films were studied, e.g. hardness, adhesion and wear behavior. The structural characterization and surface morphology were investigated using AFM, SEM, and XRD. The chemical composition and stoichiometry were measured using XPS. Corrosion resistance was determined by the potentiodynamic polarization curves. The cross-section morphology of CrN coating is a columnar structure and Cr2N is a denser structure. For the coatings by UBM system, the roughness of decreases as CrN(111)> Cr2N(111)> CrN(200) and the microhardness decreases as Cr2N(111)> CrN(200)> CrN(111). For the coatings by CAE system, the roughness of decreases as CrN(220)> CrN(200) and the microhardness decreases as CrN(200)> CrN(220). Cr2N(111) has the weakest adhesion but the hardest structure. Because of its columnar structure combined with a rougher surface, the corrosion potential of CrN(111) is more active and the corrosion current density is high. The coating layer deposited by UBM system is smooth and dense. The film deposited by CAE system has better mechanical properties than the film deposited by UBM system. However, the coating deposited by CAE usually has a lot of macroparticles.en_US
dc.description.tableofcontents摘 要 ……………………………………………………………I Abstract ………………………………………………………III 誌 謝 ……………………………………………………………V 總目錄 …………………………………………………………VI 表目錄…………………………………………………………VIII 圖目錄 …………………………………………………………IX 第一章 前言……………………………………………………1 1.1 研究動機…………………………………………………1 1.2 研究目的…………………………………………………6 第二章 文獻回顧………………………………………………9 2.1 物理氣相沈積系統………………………………………9 2.1.1 真空濺射………………………………………………9 2.1.2 非平衡磁控濺射………………………………………10 2.1.3 鍍膜成長機構…………………………………………13 2.1.4 光學發射光譜儀………………………………………15 2.1.5 離子披覆………………………………………………19 2.1.6 陰極電弧沈積原理……………………………………20 2.2 鍍膜附著性量測…………………………………………27 2.2.1 Rockwell-C壓痕試驗…………………………………27 2.2.2 刮痕試驗………………………………………………29 2.3 鍍膜硬度量測……………………………………………31 2.4 鍍膜的磨耗行為…………………………………………34 2.5 鍍膜披覆鋼材的腐蝕抗性………………………………37 2.6 鍍膜的表面自由能………………………………………39 第三章 實驗方法與步驟………………………………………41 3.1 實驗設計與流程…………………………………………41 3.2 試片規格與前處理………………………………………41 3.3 鍍膜製程參數……………………………………………45 3.4 鍍膜的分析與檢測………………………………………48 3.4.1 鍍膜結構分析…………………………………………48 3.4.2 鍍膜機械性質…………………………………………50 3.4.3 鍍膜之抗磨耗行為……………………………………52 3.4.4 動態極化掃描…………………………………………54 第四章 實驗結果與討論………………………………………59 4.1 氮化鉻覆膜成份與結構…………………………………59 4.1.1 鍍膜結晶成相…………………………………………59 4.1.2 氮化鉻的成份分析……………………………………63 4.1.3 XPS 分析鑑定…………………………………………70 4.1.4 製程參數與鍍膜結晶相………………………………71 4.1.5 氮化鉻的顯微結構……………………………………72 4.2 鍍膜的機械性質…………………………………………93 4.2.1 鍍膜微硬度之影響……………………………………93 4.2.2 優選方向與硬度值……………………………………97 4.2.3 鍍膜之附著性…………………………………………98 4.2.4 優選方向與附著性……………………………………109 4.3 磨耗行為…………………………………………………110 4.3.1 滑動性磨耗過程………………………………………110 4.3.2 優選方向與磨耗行為…………………………………120 4.4 動態極化掃描……………………………………………121 4.4.1 鍍膜之腐蝕抗性………………………………………121 4.4.2 鍍膜之緻密與否………………………………………125 4.5 接觸角量測結果…………………………………………126 第五章 結 論…………………………………………………128 第六章 參考文獻………………………………………………130zh_TW
dc.language.isozh_TWzh_TW
dc.publisher材料工程學研究所zh_TW
dc.subject物理氣相沈積zh_TW
dc.subjectPhysical vapor depositionen_US
dc.subject氮化鉻zh_TW
dc.subject非平衡磁控濺射系統zh_TW
dc.subject陰極電弧沈積系統zh_TW
dc.subject優選方向zh_TW
dc.subjectChromium nitrideen_US
dc.subjectUnbalanced magnetron (UBM)sputtering systemen_US
dc.subjectCathodic arc evaporation (CAE) systemen_US
dc.subjectPreferred orientationen_US
dc.title物理氣相沈積具優選方向之氮化鉻硬質薄膜之性質研究zh_TW
dc.typeThesis and Dissertationzh_TW
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.openairetypeThesis and Dissertation-
item.cerifentitytypePublications-
item.fulltextno fulltext-
item.languageiso639-1zh_TW-
item.grantfulltextnone-
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