Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/9810
標題: 在VOSO4水溶液中陰極沉積V2O5於鋁基材之研究
Cathodic V2O5 Deposition on Al in VOSO4 aqueous solutions
作者: 江雅萍
Chiang, Ya Ping
關鍵字: vanadium;陰極沉積;aluminum;Li-ion battery;cathode;cathodic deposition;VOSO4;鋁;陰極;VOSO4
出版社: 材料工程學研究所
摘要: 
本實驗是在VOSO4水溶液中,利用陰極沉積的方法,將V2O5薄膜沉積於鋁基材上。藉由控制不同的電化學參數(溶液、濃度、電位、電流、時間),和不同的燒結條件後,決定適當的鍍膜製程,並利用TGA/DSC、SEM/EDS、XRD及恆定電位儀,探討分析膜的物理特性及其電性。
由陰極極化實驗推論在VOSO4水溶液中陰極反應可分為三階段:(1)
(2)
(3)
由TGA/DSC曲線及XRD結果,可以推論電解沉積的機構及燒結反應機構為下:
且在T5溫度下燒結td之試片顯示出較佳V2O5薄膜之結晶性。而不同的濃度、酒精含量、沉積電位、電流及時間,則會有不同的表面型態。
在CV電性測試及放電實驗中,可看出V2O5在V2O5/LiPF6/Li系統之可逆性佳,且可對應出其工作電壓為3.17V。

Cathodic V2O5 deposition on Al was conducted in VOSO4 aqueous solutions. Compared to cathodic polarization curves in NaSO4, H2SO4 and HCl, cathodic reaction in VOSO4 could be divided into 3 stages: (1) , (2) and (3) .
Various kinds of thickness and surface morphology were obtained by controlling concentrations, applied potentials, applied currents and deposition times. Some deposited specimens were further characterized by TGA/DSC, SEM/EDS, XRD and cyclic voltammometry (CV) tests.
Results of TGA/DSC and XRD verified that the as-deposited film was VO(OH)2 at room temperature, then condensed into VO2 at 250℃, and further oxidized into V2O5 at 281℃. However, more crystalline V2O5 was found at T5 for td.
CV tests revealed that the reaction were reversible and its working voltage was 3.17V for V2O5/LiPF6/Li batteries.
URI: http://hdl.handle.net/11455/9810
Appears in Collections:材料科學與工程學系

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