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標題: Water/Oxygen Barrier Coatings on Polyethersulfone Substrates by Plasma-Enhanced Chemical Vapor Deposition
作者: 羅文池
Lo, Wun-Chi
關鍵字: Polyethersulfone;聚醚堸基材;PECVD;SiOX;SiNX;OTR;WVTR;電漿輔助化學氣相沉積;氧化矽;氮化矽;氧氣透過率;水氣透過率
出版社: 材料工程學研究所
PES披覆氧化矽、氮化矽薄膜後之穿透率可達90 %以上。在最佳的情況下,氧化矽薄膜沉積於PES後之水氣透過率(WVTR)、氧氣透過率(OTR),分別可以從未鍍膜PES試片之 28 g/m2/day、243 cc/m2/day 分別降低到0.1 g/m2/day、0.18 cc/m2/day。氮化矽薄膜沉積於PES後之WVTR、OTR值分別可以降低到0.01 g/m2/day、0.01 cc/m2/day以下。由實驗結果顯示,將阻障膜沈積在PES塑膠基板上,確實可以有效阻隔水/氧氣的滲透。

Traditional flat panel displays were built on the glasses substrate. But they do not have impact-resistance, flexibility and have the high weight and thickness. Recently, using plastic materials substrate becomes a trend in the present development to study the flexible organic light-emitting devices (FOLED). However, the high permeation of water vapors and oxygen through polymer substrate is an important problem in the FOLED applications. Most of the commercial plastic substrates cannot resist the transmission of water vapor, which can easily cause a great damage inside the display and reduces the electron injection in the OLED structure and thereby drastically decreases its performance. To resolve this problem, a gas barrier layer must be developed on the plastic substrate.
In this study, the SiOX and SiNX thin film was deposited on polyethersulfone (PES) plastic substrate by plasma-enhanced chemical vapor deposition (PECVD). Details of the effects of deposition parameters (flow ratio, chamber pressure, and rf power density, temperature, thickness) on the barrier film properties in terms of deposition rate, refractive index, roughness, etch rate, film structure, microstructure, adhesion, contact angle, flexibility, and WVTR/OTR were described, expecting for FOLED application as water/oxygen barrier layer. The transparency of the barrier layer can achieve over 80 % after coating silica and silicon nitride on PES. Under optimum conditions, the WVTR and OTR for PES can be reduced from a level of 28 g/m2/day and 243 cc/m2/day (bare substrate) to 0.1 g/m2/day and 0.18 cc/m2/day after coating silica. The WVTR and OTR for PES can be reduced to 0.01 g/m2-day and 0.01 cc/m2/day after coating silicon nitride. As a result of experiments, the deposition of SiOX and SiNX thin film on PES plastic substrate indeed resists the oxygen and water vapor transmission sufficiently.
Appears in Collections:材料科學與工程學系

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