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標題: 以熱化學氣相沉積法製備碳密封鍍層光纖:不同沉積溫度熱裂解甲烷對碳膜之影響
Hermetically carbon-coated optical fibers prepared by thermal chemical vapor deposition method: The effects of the methane pyrolysis at different deposition temperatures.
作者: Wu, Yu-Hua
關鍵字: Hermetically carbon-coated optical fibers;碳密封鍍層光纖;thermal chemical vapor deposition;熱化學氣相沉積
出版社: 材料工程學系所
本實驗是以熱化學氣相沉積法製備碳密封鍍層光纖,探討不同沉積溫度熱裂解甲烷對碳鍍層性質之影響。分別利用場發式掃描電子顯微鏡、光學顯微鏡、X光繞射儀、拉曼光譜儀、掃描探針顯微鏡、接觸角儀器、奈米壓痕儀與四點探針儀觀察與量測碳鍍層的表面形貌、微觀結構、表面特性、機械性質與電學性質。結果顯示,隨著沉積溫由900℃上升至1000℃,厚度由0.045 μm增加至4.172 μm,沉積速率由0.045 μm/hr增加至4.172 μm/hr,平均晶粒大小由26.6 Å減少為16.4 Å。此外,由於晶界變多,電阻率由11.5 Ω•μm增加至15.0 Ω•μm。當沉積溫度為950℃時,碳鍍層表面粗糙度最小,其平均粗糙度為2.58 nm;硬度值最大,其硬度值為4.40 GPa;水的接觸角度(93º)也最大,溫變抵抗性良好。綜合實驗結果發現,沉積溫度為950℃之碳鍍層光纖擁有較佳之表面形態、溫變抵抗性以及機械性質,使得碳密封鍍層可達到對玻璃光纖保護之效果。

In this experiment, hermetically carbon-coated optical fibers were prepared by thermal chemical vapor deposition method. The effects of the methane pyrolysis were studied at different deposition temperatures. The surface morphology, microstructure, surface property, mechanical property, and electrical property of carbon coatings were measured and investigated by field emission scanning electron microscope, optical microscope, X-ray Diffraction spectrometer, Raman scattering spectrometer, scanning probe microscope, contact angle meter, nanoindenter, and 4-point probe method, respectively. The results show that the thickness of carbon films increases from 0.045 μm to 4.172 μm with increasing the deposition temperature from 900℃ to 1000℃; the deposition rates of the carbon films increase from 0.045 μm/hr to 4.172 μm/hr, and the mean crystallite size decreases from 26.6 Å to 16.4 Å. In addition, as the grain boundary increases, the resistivity of carbon films increases from 11.5 Ω•μm to 15.0 Ω•μm. The carbon film deposited at temperature of 950℃ has the lowest average roughness 2.58 nm. It also possess the highest hardness and contact angle, 4.40 GPa and 93º, respectively. Moreover, it owns the best performance under the low-temperature test. Based on the experimental results, it is found that the carbon film deposited at temperature of 950℃ is the best one for use as the hermetic optical fiber coating.
Appears in Collections:材料科學與工程學系

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